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德國Raith 
Raith 有限公司生產(chǎn)一系列供研發(fā)使用的電子束光刻系統(tǒng)。該系統(tǒng)能滿足大學(xué)及工業(yè)生產(chǎn)中的研究人員、設(shè)計(jì)人員和工程師的要求。該公司的電子束光刻產(chǎn)品既包括適用于SEM（掃描電子顯微鏡）或FIB（聚焦離子束）的電腦制圖附件，也包括對(duì)整個(gè)硅片和掩膜具有處理能力的
完整系統(tǒng)。
e_LiNE，這一分辨率極高的電子束光刻系統(tǒng)是一個(gè)可供大學(xué)和其他學(xué)術(shù)機(jī)構(gòu)使用的、已達(dá)到最新技術(shù)發(fā)展水平的工具。可供選擇使用的納米操作臺(tái)、EBID 和EBIE 擴(kuò)展了該系統(tǒng)的功能，使其適用于各種納米工程工作站。e_LiNE 電子束光刻系統(tǒng)可供多數(shù)CNT 研究、薄膜工程、光
子晶體和EBID 使用。
Raith 有限公司同時(shí)也生產(chǎn)用于故障分析的超高精密度樣本鏡臺(tái)和軟件導(dǎo)航組件。ESCOSY Plus是包括Defect-Review（缺陷復(fù)查）、CAD navigation（導(dǎo)航）、Bit-Fail Map review（點(diǎn)缺陷地圖復(fù)查）和Metrology（度量衡學(xué)）等特點(diǎn)在內(nèi)的所有分析工具的導(dǎo)航解決方案。ASEM （掃描電子顯微鏡專用）系統(tǒng)具有特殊功能，如逆向工程或高精度測(cè)量。它是Raith 設(shè)計(jì)、制造先進(jìn)的、具有前沿性的系統(tǒng)的典范。
5 年來，Raith 有限公司一直在使用其在多特蒙德的應(yīng)用實(shí)驗(yàn)室，不斷提高電子束光刻系統(tǒng)知識(shí)和Raith 電子束光刻系統(tǒng)設(shè)備的性能。
Raith 有限公司的全球服務(wù)和銷售伙伴為客戶提供幫助。
Raith 有限公司會(huì)在網(wǎng)站上發(fā)布其每年舉行的活動(dòng)，如客戶會(huì)面會(huì)、培訓(xùn)課程和納米研討會(huì)等。
2006 年是Raith 有限公司成立26 周年紀(jì)念日，我們感謝所有客戶對(duì)我們產(chǎn)品的信任。
Raith manufactures a variety of electron beam lithography systems for research and
development applications. The tools are designed to meet the needs of researchers, designers,
and engineers in both university and industry settings. Our family of lithography products
range from PC driven pattern generator attachments for SEMs or FIBs, to complete systems
with full wafer and mask handling capabilities.
e_LiNE, an ultra high resolution electron beam lithography system, is a state-of-the-art tool
for universities and other academic institutions. Selected options for nanomanipulation, EBID
and EBIE expand this system to a versatile nano engineering workstation. The state-of-theart
e_LiNE electron column matches perfectly with a number of key applications in CNT
research, thin film engineering, photonic crystals and EBID.
Raith GmbH also manufactures ultra-high precision sample stages and software navigation
packages for failure analysis applications. ESCOSY Plus is the navigation solution for all
your analytical tools featuring: Defect-Review, CAD navigation, Bit-Fail Map review and
Metrology in one economical package. ASEMs (Application Specific SEMs) with specialized
functions, such as reverse engineering or high-precision metrology, are examples of Raith
expertise for design and manufacturing of advanced, leading edge, systems.
Since about 5 years Raith GmbH is operating its own application laboratory in Dortmund for
continuously increasing the EBL process knowledge and the performance of Raith EBL tools.
A global network of service and sales partners is supporting our customers.
Annual events like user meetings, trainings courses and the Raith NANO seminar are
announced on our web site.
In 2006 Raith GmbH has celebrated its 26th anniversary. We thank all our customers for their
trust in Raith products!